Japanese conglomerate Fujifilm has opened a new facility for the production of Chemical Mechanical Polishing (CMP) slurries, a basic material used in semiconductor manufacturing process. CMP slurries ...
Fujifilm is rapidly expanding its production of semiconductor materials in Kyushu, Japan. In addition to increasing the production capacity of chemical mechanical polishing (CMP) slurries at its ...
Japan-based Fuso Chemical, the global leader in semiconductor CMP slurries with a 90% market share, is set to invest JPY 50 billion (US$350 million) in a significant production expansion. Despite the ...
SANTA CLARA, Calif.--(BUSINESS WIRE)--June 25, 2003--Applied Materials, Inc. (Nasdaq:AMAT) announces Reflexion(R) LK, the industry's only low down force, high throughput CMP (chemical mechanical ...
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