The use of finFETs and multi-patterning has a huge impact on the entire physical implementation flow. This paper outlines the new challenges in placement, routing, optimization, and physical ...

FinFET technology is seen as the answer to fabrication processes below 20 nm. However, FinFET also presents a lot of uncertainty and concern related to defect manifestation, necessary test methods, ...

Mentor Graphics partnered with TSMC to add a spectrum of new capabilities for their mutual customers' adoption of 10nm FinFET technology. The new capabilities include advanced double patterning, DRC ...

WILSONVILLE, Ore.--(BUSINESS WIRE)-- Mentor Graphics Corp. (NAS: MENT) today announced that its Calibre® physical verification platform has achieved version 0.1 of design reference manual (DRM) and ...

“As the developer of the industry’s first modular 14nm FinFET technology and one of the leaders at 20nm, we understand that enabling designs at these advanced process nodes requires innovative ...

The next frontier in the electronics industry is the FinFET, a new type of multi-gate 3D transistor that offers tremendous power and performance advantages compared to traditional, planar transistors.

At Intel’s recent Technology and Manufacturing Day, Intel presented more details regarding its 10nm FinFET manufacturing process. In the presentation materials, Intel highlighted some of the major ...

Since the inception of the integrated-circuit (IC) industry, design metrics such as performance, power, area, cost, and time-to-market have remained the same. In fact, Moore’s law is all about ...

According to a recent announcement, Samsung has begun mass production of the industry’s first 10nm FinFET SoCs further solidifying Samsung’s position as one of the world’s most advanced chipmakers.

The use of finFETs and multi-patterning has a huge impact on the entire physical implementation flow. This paper outlines the new challenges in placement, routing, optimization, and physical ...